Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane

摘要

Parallelism of a pellicle membrane surface of a pellicle 11 and a mask surface is adjusted and secured during light exposure. A light exposure apparatus is characterized in that it is provided with a mask holding part 8 and a pellicle holding part 9 or a pellicle supporting part. As another means, in a pellicle for lithography utilizing a glass plate as a pellicle membrane, the glass plate is formed beforehand to have warpage and adhered on a pellicle frame so that a convex surface of the glass plate should become an upper surface. A pellicle in which a glass plate is adhered to a preliminarily deformed pellicle frame on which the glass plate is to be placed, so that the glass plate should be given tension by stress obtained by resilience of the pellicle frame, and a pellicle in which a space surrounded by a pellicle comprising a glass plate and a pellicle frame and a photomask is decompressed. According to the present invention, resolution of lithography utilizing a pellicle is improved.