Antireflection film, process for forming the antireflection film, and antireflection glass

摘要

An antireflection film having a refractive index of from 1.33 to 1.38 and a contact angle of water of at most 40 DEG which is formed as adhered to a glass surface, by preparing a reaction mixture comprising a silicon compound (A) of the following formula (1): Si(OR)4 wherein R is a C1-5 alkyl group, a silicon compound (B) of the following formula (2): R<1>Si(OR<2>)3 wherein R<1> is a C1-18 organic group, and R<2> is a C1-5 alkyl group, an alcohol (C) of the following formula (3): R<3>CH2OH wherein R<3> is a hydrogen atom or an unsubstituted or substituted C1-12 alkyl group, and oxalic acid (D), in a ratio of from 0.05 to 4.5 mol of the silicon compound (B) per mol of the silicon compound (A), in a ratio of from 0.5 to 100 mol of the alcohol (C) per mol of the total alkoxy groups contained in the silicon compounds (A) and (B), and in a ratio of from 0.2 to 2 mol of the oxalic acid per mol of the total alkoxy groups contained in the silicon compounds (A) and (B); heating the reaction mixture at a temperature of from 50 to 180 DEG C until the total amount of the silicon compounds (A) and (B) remaining in the reaction mixture becomes at most 5 mol%, while maintaining a SiO2 concentration of from 0.5 to 10 wt% as calculated from silicon atoms in the reaction mixture and maintaining absence of water, to form a polysiloxane solution; coating the polysiloxane solution on a glass surface to form a coating film; and thermosetting the coating film at a temperature of from 480 to 520 DEG C.