| 摘要 |
<p>An ozone processing apparatus for a semiconductor processing system includes an ozone generating unit (30) and a reforming processing unit (50) connected to each other through a connection piping section (40). The ozone generating unit (30) includes an ozone generator (33) and a pressure regulator (34) connected to each other through a piping line (35). The connection piping section (40) has a double-pipe structure consisting of an inner pipe (41) and an outer pipe (42). The piping line (35) and the inner pipe (41) are made of a fluorocarbon resin. A branch line (36) branches from the middle of the piping line (35), and is connected to a factory exhaust passageway. The branch line (36) is provided with a flowmeter (37) and an ozone densitometer (38). A controller (67) is arranged to control the ozone generator (33) with reference to the value of ozone concentration measured by the densitometer (38). <IMAGE></p> |
