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发明名称
Ion implantation apparatus and method of implantation by use of this apparatus
摘要
申请公布号
GB2357370(A)
申请公布日期
2001.06.20
申请号
GB20000023790
申请日期
2000.09.28
申请人
* NEC CORPORATION
发明人
HIROO * MATSUDA
分类号
H01J37/317;H01L21/265;(IPC1-7):H01J37/30
主分类号
H01J37/317
代理机构
代理人
主权项
地址
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