| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device capable of uniformly polishing each portion of an article to be polished. SOLUTION: A polishing table 12 comprises a generally columnar center rotating portion 13, a generally cylindrical first ring rotating portion 14 provided so as to surround an outer periphery of the center rotating portion 13, and a generally cylindrical second ring rotating portion 15 provided so as to surround an outer periphery of the first ring rotating portion 14. The center rotating portion 13, the first ring rotating portion 143 and the second ring rotating portion 15 are supported so as to freely rotate around a rotational axis along a vertical direction, and can be respectively controlled in rotating speed and a rotating direction. |
