发明名称 Method of wafer temperature measurement
摘要 A method for determining the temperature of a wafer during processing is disclosed. A test wafer is specially prepared in conjunction with a calibration chart. The difference in stack sheet resistance of the test wafer before and after processing is plotted onto the calibration chart to determine the temperature of the test wafer during processing.
申请公布号 US6247842(B1) 申请公布日期 2001.06.19
申请号 US19990334147 申请日期 1999.06.15
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 KITCH VASSILI M.;BROWN KEVIN C.;VLASSAK JOOST J.
分类号 G01K7/16;G01K15/00;(IPC1-7):G01K15/00 主分类号 G01K7/16
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