发明名称 Method for producing a predetermined resist pattern
摘要 A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.
申请公布号 US6248505(B1) 申请公布日期 2001.06.19
申请号 US19990267859 申请日期 1999.03.12
申请人 KODAK POLYCHROME GRAPHICS, LLC 发明人 MCCULLOUGH CHRISTOPHER DAVID;RAY KEVIN BARRY
分类号 B41C1/10;B41M5/36;G03F7/021;(IPC1-7):G03F7/30 主分类号 B41C1/10
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