发明名称 |
Method for producing a predetermined resist pattern |
摘要 |
A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.
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申请公布号 |
US6248505(B1) |
申请公布日期 |
2001.06.19 |
申请号 |
US19990267859 |
申请日期 |
1999.03.12 |
申请人 |
KODAK POLYCHROME GRAPHICS, LLC |
发明人 |
MCCULLOUGH CHRISTOPHER DAVID;RAY KEVIN BARRY |
分类号 |
B41C1/10;B41M5/36;G03F7/021;(IPC1-7):G03F7/30 |
主分类号 |
B41C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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