发明名称 Field-effect transistor and fabrication method thereof and image display apparatus
摘要 An amorphous silicon thin film transistor for active matrix liquid crystal displays according to the present invention comprises a transparent conductive film, which is formed together with a picture element electrode, a metal film, which is formed together with a signal wiring, a multi-layer film, and an insulation substrate. The multi-layer film, which consists of a semi-conductor film, a gate insulation film and a gate metal film, is placed on the transparent conductive film and metal film overlapping respectively at both edges of the multi-layer film.
申请公布号 US6248634(B1) 申请公布日期 2001.06.19
申请号 US20000502504 申请日期 2000.02.11
申请人 NEC CORPORATION 发明人 HAYAMA HIROSHI;NISHIDA SHINICHI
分类号 G02F1/1362;G02F1/1368;H01L29/45;H01L29/786;(IPC1-7):H01L21/336;H01L21/320;H01L21/476 主分类号 G02F1/1362
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