发明名称 DEVICE AND METHOD FOR DOUBLE-SIDED POLISHING
摘要 PROBLEM TO BE SOLVED: To provide a device and a method for double-sided polishing that both remove anomalous bumps from both obverse and reverse sides of a disk being polished such as a magnetic disk substrate while eliminating static electricity generated in the polishing. SOLUTION: The device for double-sided polishing comprises spindle means for rotating a disk to be polished, a pair of arms arranged with respective rubber pads fixed to the points in opposed relation, means for letting off and taking up abrasive tapes, means for pressing the abrasive tapes running on the rubber pads against the polished disk to sandwich it from both sides, and means for reciprocating the anus in the radial directions of the polished disk. For the polishing work on the polished disk, with the abrasive tapes run while pressed by the rubber pads against both sides of the polished disk, the arms are reciprocated in the radial directions of the polished disk. The abrasive tapes have on the back an antistatic film, which eliminates static electricity.
申请公布号 JP2001162504(A) 申请公布日期 2001.06.19
申请号 JP19990344191 申请日期 1999.12.03
申请人 NIHON MICRO COATING CO LTD 发明人 HORIE YUJI;OKUYAMA HIROMITSU;TADA TETSUJIRO
分类号 B24B7/17;B24B21/00;B24B21/12;(IPC1-7):B24B21/00 主分类号 B24B7/17
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