Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same

摘要

Disclosed are a photosensitive resin composition which comprises:(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a surface treated phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a plate for a display panel.