| 发明名称 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 摘要 |
The present invention adheres to an optimized coil-domed geometry including a particular dome apex height range relative to the dome base and a particular wafer position range relative to the dome apex.
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| 申请公布号 |
US6248250(B1) |
申请公布日期 |
2001.06.19 |
| 申请号 |
US19970897436 |
申请日期 |
1997.07.21 |
| 申请人 |
APPLIED MATERIALS INC. |
发明人 |
HANAWA HIROJI;YIN GERALD ZHEYAO;MA DIANA XIAOBING;SAIZMAN PHILIP M.;LOEWENHARDT PETER K.;ZHAO ALLEN |
| 分类号 |
H05H1/46;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H05H1/46 |
主分类号 |
H05H1/46 |
| 代理机构 |
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