发明名称 Method and apparatus for passive optical characterization of semiconductor substrates subjected to high energy (MEV) ion implantation using high-injection surface photovoltage
摘要 A semiconductor testing device is used for testing a semiconductor device which has at least one spherical connection terminal. The testing device includes an insulating substrate having an opening formed therein at a position corresponding to the position of the spherical connection terminal, and a contact member, formed on the insulating substrate, including a connection portion which is connected with the spherical connection terminal, at least the connection portion being deformable and extending into the opening.
申请公布号 US6249135(B1) 申请公布日期 2001.06.19
申请号 US19990268338 申请日期 1999.03.16
申请人 FUJITSU LIMITED 发明人 MARUYAMA SHIGEYUKI;TASHIRO KAZUHIRO;HASEYAMA MAKOTO;FUKAYA FUTOSHI
分类号 G01R31/302;G01R31/308;H05K3/32;(IPC1-7):G01R31/26 主分类号 G01R31/302
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