| 摘要 |
PURPOSE: An exposure apparatus, its method and a method for preparing a device by using the exposure apparatus are provided, to improve the roughness uniformity (exposure amount control precision) of a photosensitive substrate and to allow the desired pattern only of a mask to be transferred to the substrate. CONSTITUTION: The exposure apparatus scanning exposes a substrate by projecting the pattern image of a mask on a substrate with simultaneously moving the substrate to a certain scanning direction; and comprises a beam source which ejects the exposure beam irradiated to the mask, a conversion means which converts the illumination method of the mask by the exposure beam ejected from the beam source, and an adjusting means which adjusts the shape of the irradiated region of the exposure beam by the conversion of the illumination method.
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