| 摘要 |
PURPOSE: An exposing method for forming a fine pattern is provided to prevent the resolution from lowering due to the interference of light by arranging a slit between a light source for exposing and a mask for exposing to the direction vertical to the direction of the light. CONSTITUTION: A slit(26) is arranged between a light source(20) and a mask(26) for exposing, and a lens(27) and a wafer(28) are arranged on the lower part of the mask(26) in turns. The first light(L4) from the light source(20) is diffracted to the second light(L5) via a slit(23), the second light(L5) is diffracted to the third light(L6) via the mask(26), and the third light(L6) is diffracted to the fourth light(L7) via the lens(27), so that a photosensitive film formed on the wafer(28) is exposed by the fourth light(L7).
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