ILLUMINATION SYSTEM WITH MULTIPLE LIGHT SOURCES

摘要

PURPOSE: Provided is an illumination system including a plurality of light sources and a plurality of mirrors for forming a secondary light source. CONSTITUTION: The illumination system comprises a plurality of light sources(1.1,1.2) of a laser plasma type that are set at the focal point of a plurality of reflector dishes(2.1,2.2). The convergent beams are directed onto the angled surfaces of a plurality of field plates(4.1,4.2) and are reflected as a secondary light source(6). The illumination system is useful of an EUV-lithography and the wavelength of the illumination system is <= 193nm.