发明名称 |
DÜNNE SIO 2-FOLIEN, VERFAHREN ZU IHRER HERSTELLUNG UND IHRE VERWENDUNG |
摘要 |
<p>PCT No. PCT/EP96/04069 Sec. 371 Date Mar. 19, 1998 Sec. 102(e) Date Mar. 19, 1998 PCT Filed Sep. 17, 1996 PCT Pub. No. WO97/11035 PCT Pub. Date Mar. 27, 1997Thin SiO2 films can be produced by hydrolysis and condensation of a) 40 to 100% by weight of one or more silanes of general formula (I) Rx-Si-A4-x(I) in which the groups A are identical or different and stand for hydroxyl groups or hydrolytically separable groups, the groups R are identical or different and stand for hydrolytically non-separable groups, x has the value 0, 1, 2 or 3, x being not less than 1 for 70% by moles of said silanes; b) optionally in the presence of 0 to 50% by weight of colloidal SiO2 and/or c) 0 to 10% by weight of organic binder. The viscous sol thus obtained is worked into a gel film which is heat-treated.</p> |
申请公布号 |
AT201665(T) |
申请公布日期 |
2001.06.15 |
申请号 |
AT19960932547T |
申请日期 |
1996.09.17 |
申请人 |
INSTITUT FUER NEUE MATERIALIEN GEMEINNUETZIGE GMBH |
发明人 |
SCHMIDT, HELMUT;MENNIG, MARTIN;JONSCHKER, GERHARD;SUYAL, NAVIN |
分类号 |
C03B8/02;B01D71/02;B01D71/04;C03B19/12;C03C1/00;C04B35/14;C04B35/622;C04B35/626;C08G77/06;(IPC1-7):C03C1/00 |
主分类号 |
C03B8/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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