PHOTOSENSITIVE POLYMER HAVING ANNULAR BACKBONE STRUCTURE AND RESIST COMPOSITION CONTAINING THE SAME

摘要

PURPOSE: A photosensitive polymer having an annular backbone structure is provided, which has enough resistance to dry-etching and provides good adhesion property to the lower part membrane. And a resist composition containing the same is also provided, which provides excellent lithography performance in a lithography process using an ArF eximer laser. CONSTITUTION: The photosensitive polymer is represented by the formula described as in the description and has an average molecular weight of 3,000-100,000. In the formula, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile tertiary alkyl group, and m/(m+n) is 0.5-0.8. The photoresist composition comprises: (i) the photosensitive polymer; and (ii) a photoacid generator.