METHOD FOR MANUFACTURING METAL INTERCONNECTION

摘要

PURPOSE: A method for manufacturing a metal interconnection is provided to extend the lifetime of the metal interconnection, by forming a metal nitride deposition layer inside a metal interconnection layer so that a void as a main cause of an electromigration defect is prevented from being transformed from a circular type to a slit type and the void is prevented from growing. CONSTITUTION: A metal alloy layer(12) is deposited on an insulating layer(11). Nitrogen ions are implanted into the entire surface of the metal alloy layer, and annealed to form a metal nitride deposition layer(13) inside the metal alloy layer. The metal alloy layer and the metal nitride deposition layer are etched to form a metal interconnection layer, which has the metal nitride deposition layer inside the metal alloy layer.