| 摘要 |
PURPOSE: An illuminator of a stepper for exposing a wafer is provided to prevent an illumination deterioration due to the oxidation of a lens plane by using nitrogen as a driving source of a pneumatic cylinder included in the illuminator of a DVD stepper. CONSTITUTION: In an illuminator of a stepper for exposing a wafer, a detector is placed in a beam shaping guide unit. The detector(5) detects an oxygen density in the beam shaping guide unit. A purge line is placed in one side of the air chamber and the beam shaping guide unit. The purge line is provided to depurate the inside of the beam shaping guide unit. A nitrogen gas is stored in the air chamber as to use as the driving source supplied to a pneumatic cylinder.
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