| 摘要 |
PURPOSE: An exposure apparatus and a method for operating exposure apparatus are provided to allow the positioning function of the object or wafer stage to be accomplished while minimizing vibrations coupled to the stage and lens systems from a reaction stage faster and with fewer parts while minimizing vibrations coupled to the stage and isolating the stage from undesired reaction forces. CONSTITUTION: A photolithographic instrument(10) comprises an upper optical system(12) and a lower wafer support and positioning system(13). The optical system(12) includes an illuminator(1H) including a lamp(LMP), such as a mercury lamp, and an ellipsoid mirror(EM) surrounding the lamp. The illuminator(1H) comprises optical integrator such as a fly's eye lens(FEL) producing secondary light source images and a condenser lens(CL) for illuminating a reticle(R) with uniformed light flux. A mask holder(RST) holding the mask is mounted above a lens barrel(PL) of a projection optical system(16). The lens barrel(PL) is fixed on a part of a column assembly which is supported on a plurality of rigid arms(18) each mounted on the top portion of an isolation pad or block system(20). |
