发明名称 FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A method for manufacturing a field effect transistor is provided to efficiently radiate a lot of quantity of heat generated in a channel layer, and to reduce parasitic inductance by a bonding wire. CONSTITUTION: A channel layer is formed on a semiconductor substrate. A source electrode, a drain electrode and a gate electrode are formed on the channel layer. An insulating layer is formed on the channel layer, the source electrode, the drain electrode and the gate electrode. A bump composed of a conductive material is formed on the source electrode so that a part of the bump is buried in the insulating layer and the rest of the bump is protruded from the insulating layer.
申请公布号 KR20010048979(A) 申请公布日期 2001.06.15
申请号 KR19990053886 申请日期 1999.11.30
申请人 KOREA ELECTRONICS & TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM, HAE CHEON;KWAK, MYEONG HYEON;LEE, JAE JIN;LIM, JONG WON;MUN, JAE GYEONG
分类号 H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/78
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