发明名称 |
FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A method for manufacturing a field effect transistor is provided to efficiently radiate a lot of quantity of heat generated in a channel layer, and to reduce parasitic inductance by a bonding wire. CONSTITUTION: A channel layer is formed on a semiconductor substrate. A source electrode, a drain electrode and a gate electrode are formed on the channel layer. An insulating layer is formed on the channel layer, the source electrode, the drain electrode and the gate electrode. A bump composed of a conductive material is formed on the source electrode so that a part of the bump is buried in the insulating layer and the rest of the bump is protruded from the insulating layer.
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申请公布号 |
KR20010048979(A) |
申请公布日期 |
2001.06.15 |
申请号 |
KR19990053886 |
申请日期 |
1999.11.30 |
申请人 |
KOREA ELECTRONICS & TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KIM, HAE CHEON;KWAK, MYEONG HYEON;LEE, JAE JIN;LIM, JONG WON;MUN, JAE GYEONG |
分类号 |
H01L29/78;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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