PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD

摘要

PURPOSE: Provided is a plasma treatment device capable of stably generating small and uniform plasma and of giving plasma treatment to thick materials to be treated. CONSTITUTION: This device has a chamber(1) in which a high voltage electrode(2) and an earth electrode(3) are provided. Plasma generating gas is introduced into the chamber(1) and an alternating field is applied between the high voltage electrode(2) and the earth electrode(3) to generate dielectric barrier discharge between the high voltage electrode(2) and the earth electrode(3) under atmospheric pressure. The dielectric barrier discharge is used to generate plasma from the plasma generating gas and the plasma is used to give plasma treatment to a material(4) introduced between the high voltage electrode(2) and the earth electrode(3). A carrying means (roller)(5) is provided in the chamber(1) at its position, other than an opposed space between the high voltage electrode(2) and the earth electrode(3), for carrying the material(4) to be treated. The carrying means(5) can be limited not to project largely outward from the chamber(1).