发明名称 |
METHOD FOR DETERMINING RADIATION INTENSITY OF LAYOUT |
摘要 |
PURPOSE: A method for determining a radiation intensity of a layout is provided to remove an inter-influence of adjacent revealed figures. CONSTITUTION: According to the method for determining the radiation intensity of a layout including a plurality of revealed figures having different feature width and different feature spacing, in order to correct an approaching effect, according to the conditions of a regular electron beam exposure, a whole layout surface(S1) is divided into different segmental partial surfaces(Fx) according to the feature width and the feature spacing. And an evaluation criteria(Kx) of the radiation intensity toward each partial surface is determined, and the corresponding evaluation criteria is allocated to each partial surface. And the regular-beam exposure is performed by considering the evaluation criteria. |
申请公布号 |
KR20010050123(A) |
申请公布日期 |
2001.06.15 |
申请号 |
KR20000047831 |
申请日期 |
2000.08.18 |
申请人 |
LEICA MICROSYSTEMS LITHOGRAPHY GMBH |
发明人 |
BAETZ ULRICH;EICHHORN HANS-GUENTHER |
分类号 |
G03F1/08;G03F7/20;G03F9/00;H01J37/302;H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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