| 摘要 |
PURPOSE: A wet station is provided to perform a wet-etching process in a stable state, by preventing a chemical bath from being contaminated by waterdrop formed on the surface of a cover, and by preventing variation of density and temperature of chemicals. CONSTITUTION: An upper portion of a chemical bath(12) is opened, and chemicals are contained in the chemical bath. A cover(20) is installed in the upper portion of the chemical bath, covering the open upper portion of the chemical bath, wherein the cover is inclined so that waterdrop(28) on the upper and bottom surfaces(22a,22b) of the cover can flow to the outside of the chemical bath.
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