| 摘要 |
PURPOSE: A rapid thermal processing apparatus is provided to easily replace a lamp by exchanging the lamps by a single module unit, and to improve temperature uniformity by reducing change of temperature distribution according to a structural error generated in the exchange process. CONSTITUTION: A rapid thermal processing apparatus includes a process chamber, a wafer supporting unit, a heating unit and a power controller. The heating unit includes a plurality of single modules in which both ends of a plurality of bar-type infrared lamps(40) are fixed in two fixing units(147') vertical to the infrared lamps. The fixing unit has a plurality of electrodes(148') and an insulator for insulating the surface of the fixing units. The electrodes are electrically connected to ends of the infrared lamps by one-to-one correspondence to the infrared lamps. External power is distributed and applied to the electrodes.
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