METHOD FOR CONTROLLING THE TRANSFER OF SEMICONDUCTOR WAFER

摘要

PURPOSE: A method for controlling the transfer of a semiconductor wafer is provided to control a SEMICONDUCTOR wafer transferred to a chemical bath in order to minimize fine water drops. CONSTITUTION: A method for controlling the transfer of a semiconductor wafer consists of the following steps; descending the semiconductor wafer on top of a chemical bath that is filled with the chemicals and stopping in the position adjacent to the surface of the chemicals; descending the semiconductor wafer of the position adjacent to the surface of the chemicals and stopping in the position soaked above the chemicals; descending the semiconductor wafer of the position soaked above the chemicals and stopping in the position entirely soaked in the chemicals; descending the semiconductor wafer of the position entirely soaked in the chemicals and stopping in the predetermined stop position.