| 摘要 |
<p>There is provided by this invention an apparatus and method for generating voltage pulses (V) to first (A) and second (B) magnetron devices in a plasma chamber (4). An isolation transformer (8) is connected to a pulsed DC power supply (2) having a flux sensor (10), such as a Hall effect sensor, in close proximity to its air gap (12) to monitor the transformer flux (B). A control circuit is connected to the flux sensor (10) to control the duty cycle of the transformer (8) by controlling the flux (B) of the transformer (8) such that the maximum and minimum peak transformer fluxes (B) are equal in magnitude and opposite in sign to prevent saturation.</p> |
