| 发明名称 |
PHOTORESIST COMPOSITION FOR DEEP UV RADIATION |
| 摘要 |
The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region, where the photoresist is not sensitive to basic contaminants in the processing environment of the photoresist.
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| 申请公布号 |
WO0142853(A2) |
申请公布日期 |
2001.06.14 |
| 申请号 |
WO2000EP11495 |
申请日期 |
2000.11.18 |
| 申请人 |
CLARIANT INTERNATIONAL LTD.;CLARIANT FINANCE (BVI) LIMITED |
发明人 |
PADMANABAN, MUNIRATHNA;DAMMEL, RALPH, R. |
| 分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F/ |
主分类号 |
G03F7/004 |
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