| 发明名称 |
Lithographic apparatus with mask clamping apparatus |
| 摘要 |
<p>An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but without deforming the mask 10. <IMAGE></p> |
| 申请公布号 |
EP1107066(A2) |
申请公布日期 |
2001.06.13 |
| 申请号 |
EP20000310188 |
申请日期 |
2000.11.16 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DONDERS, SJOERD NICOLAAS LAMBERTUS;VAN EMPEL, TJARKO ADRIAAN RUDOLF |
| 分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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