| 摘要 |
PURPOSE: A pure water providing device is provided to improve quality by constantly keeping same amount of a plating solution. CONSTITUTION: A plating tank(1) holds a plating solution to plate a wafer. A pure water supply line is able to provide the pure water to the upper side of the tank(1). An empty detecting sensor(11), a full detecting sensor(12), a first over detecting sensor(13) and a second over detecting sensor(14) are equipped on one inner side of the tank(1) according to a height difference. A timer(15) is equipped to transfer a signal of the empty detecting sensor(11). A relay(16) is equipped to be connected to the timer(15) and the sensors(11,12,13,14) to transfer signals of the sensors(11,12,13,14). Solenoid valves(18,18') are equipped on the pure water supply line to be opened and shut according to the signal of the relay(16).
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