发明名称 |
Method for producing multi-level contacts |
摘要 |
The present invention relates to a method for overcming problems of amplified exposure light interference from shrinked devices and difficulties of photolithographic and etching process control due to multi-level contacts. The present invention combines reflective lights from multiple levels into one single light and reduces interference of reflective lights by introducing a reflective coating and an anti-reflective coating of SiON/Ti or SiON/TiN/Ti which further serve as an etching hard mask for avoiding overetching. The process windows are expanded. Semiconductor devices can be further shrunk and production yields an be improved.
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申请公布号 |
US6245656(B1) |
申请公布日期 |
2001.06.12 |
申请号 |
US19990435512 |
申请日期 |
1999.11.08 |
申请人 |
VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
CHEN BI-LING;JENG ERIK S.;CHANG SHIH-MING |
分类号 |
H01L21/311;H01L21/768;(IPC1-7):H01L21/476 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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