发明名称 STAGE SYSTEM AND EXPOSURE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent the positions of objects on two stages from causing misalignment, when switching theses stages and apply different processings in parallel to the objects on the stages. SOLUTION: Stages WST1 and WST2 can be switched in non contact manner to mobile objects 62 and 64, while utilizing magnetic forces or the like, by moving the mobile objects 62 and 64 in the X-axis direction. Also the stages WST1 and WST2 are respectively provided with needed for generating Lorentz's forces in the Y-axis direction between stators 68 and 76. Therefore, in the case of switching, no impulse will act on each of the stages, the positions of wafers W1 and W2 on the respective stages are prevented from deviating, and different kinds of processing can be applied to the wafers W1 and W2, while simultaneously and parallel driving both the stages WST1 and WST2.</p>
申请公布号 JP2001160530(A) 申请公布日期 2001.06.12
申请号 JP19990341844 申请日期 1999.12.01
申请人 NIKON CORP 发明人 TANAKA KEIICHI
分类号 B23Q5/28;G03F7/20;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 B23Q5/28
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