| 摘要 |
Vapor coating apparatus comprising a chamber having a liquid inlet, atomization means, and chilled substrate support. Carrier gas and coating liquid (e.g. monomer or polymer) are contacted under conditions that vaporize the liquid. Nozzle near chamber inlet has liquid and carrier gas inlets, outlets, and passageways through which liquid and gas streams flow. The outlets and passageways are shaped so that the liquid and carrier gas streams collide outside the nozzle, and the liquid is atomized and then vaporized due to conditions within the chamber. The vapor flows to a substrate at the chamber outlet where it is condensed. The gas discharged from the nozzle is at high velocity and can be shaped as a cone surrounding the liquid discharged from the nozzle in the interior of the gas stream cone.
|
