发明名称 Resist composition
摘要 A resist composition exhibiting an improved profile performance without impairing the resolution, the sensitivity, etc. which comprises a binder component; a radiation-sensitive component; and a succinimide compound represented by the following formula (I):wherein Q1 represents an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group; and Q2, which may be the same as or different from Q1, represents hydrogen, an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group.
申请公布号 US6245478(B1) 申请公布日期 2001.06.12
申请号 US19990398998 申请日期 1999.09.17
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 UETANI YASUNORI;TAKEMOTO ICHIKI
分类号 H01L21/027;G03F7/004;G03F7/008;G03F7/022;G03F7/038;G03F7/039;(IPC1-7):G03F7/023 主分类号 H01L21/027
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