发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To moderate the thermal gradient between the areas of paired elements formed on an SOI substrate. SOLUTION: A semiconductor device is provided with an element isolation section 4 made of a material having a higher coefficient of thermal conductivity than the buried insulating layer 1b of the SOI substrate 1 between paired bipolar transistors Q1 and Q2 provided on the semiconductor layer lc of the substrate 1.
申请公布号 JP2001160588(A) 申请公布日期 2001.06.12
申请号 JP19990344161 申请日期 1999.12.03
申请人 HITACHI LTD 发明人 TAKAKU ATSUSHI
分类号 H01L29/73;H01L21/331;H01L21/76;H01L21/762;H01L21/8222;H01L27/06;(IPC1-7):H01L21/76 主分类号 H01L29/73
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