发明名称 High power gas discharge laser with helium purged line narrowing unit
摘要 A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the use of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
申请公布号 AU1800201(A) 申请公布日期 2001.06.12
申请号 AU20010018002 申请日期 2000.11.22
申请人 CYMER, INC. 发明人 WILLIAM N PARTLO;RICHARD L SANDSTROM;RAYMOND F. CYBULSKI;IGOR V FOMENKOV;ALEXANDER I. ERSHOV
分类号 H01S3/03;G03F7/20;H01S3/036;H01S3/04;H01S3/041;H01S3/1055;H01S3/225 主分类号 H01S3/03
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