发明名称 |
Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet |
摘要 |
A chemical mechanical polishing apparatus has a rotatable platen, a generally linear polishing sheet having an exposed portion extending over a top surface of the platen for polishing the substrate, and a drive mechanism to incrementally advance the polishing sheet in a linear direction across a top surface of the platen. The polishing sheet is releasably secured to the platen to rotate with the platen, and it has a width greater than a diameter of the substrate.
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申请公布号 |
US6244935(B1) |
申请公布日期 |
2001.06.12 |
申请号 |
US19990244456 |
申请日期 |
1999.02.04 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BIRANG MANOOCHER;ROSENBERG LAWRENCE M.;SOMEKH SASSON;WHITE JOHN M |
分类号 |
B24B21/04;B24B27/00;B24B37/04;B24D7/12;H01L21/306;(IPC1-7):B24B1/00 |
主分类号 |
B24B21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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