发明名称 PLASTIC-WORKING METHOD FOR THERMOELECTRIC SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To prevent performance degradation caused by change in the thermoelectric semiconductor material composition caused by oxidation by suppressing oxidation, related to a method or a thermoelectric semiconductor. SOLUTION: A thermoelectric semiconductor is plastic-worked in such atmospheric environment with oxygen concentration 10,000 ppm or below. With oxygen concentration 10,000 ppm or below, the performance degradation due to oxidation of a thermoelectric semiconductor is significantly suppressed.
申请公布号 JP2001156346(A) 申请公布日期 2001.06.08
申请号 JP19990335567 申请日期 1999.11.26
申请人 AISIN SEIKI CO LTD 发明人 TAUCHI HITOSHI;HORI SATOSHI;SUGIURA HIROTANE;KOJIMA HIROYASU
分类号 H01L35/34;(IPC1-7):H01L35/34 主分类号 H01L35/34
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