REMOVAL METHOD FOR CONTAMINATION MATERIAL AND ITS DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a reval method for contamination materials and its device capable of easily removing contaminated layer. SOLUTION: A base body 100 is put inside a chamber 11 and an exhaust pump 14 is operated, and an exciting light source 13 is operated to cast the exciting light 2. If a raw material gas 1 is supplied inside the chamber 11 by operating a raw material gas supply device 12 and the raw material gas 1 is excited by the exciting light 2. Active body 1a such as activated halogen or carbonyl is generated which reacts with metal element in the contaminated layer 101. The metal is halogenized or carbonylated and vaporized to be exhaust gas 3 which is sucked in the exhaust (sucking) pump 14 to be recovered and removed by a recovery remover 15. By this, the contaminated layer 101 on the base body 100 can be decomposed and removed.