发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device that is inexpensive, can be manufactured easily, and has improved functions, and its manufacturing method. SOLUTION: In the semiconductor device, a porous semiconductor layer and an inorganic semiconductor layer are successively laminated (1), there is an organic matter between the porous semiconductor layer and the inorganic semiconductor layer (2), and there is an organic single molecular layer between two inorganic semiconductor layers (3). The manufacturing device is manufactured by dipping the porous semiconductor layer or a semiconductor layer with an organic matter layer on the surface into a solution containing the component of the inorganic semiconductor or a compound containing the component, and forming the porous semiconductor layer or the inorganic semiconductor layer on the organic matter layer in the solution.</p>
申请公布号 JP2001156321(A) 申请公布日期 2001.06.08
申请号 JP20000036815 申请日期 2000.02.15
申请人 FUJI XEROX CO LTD 发明人 YAMAZAKI YOSHIFUMI;ONO YOSHIYUKI;TAKADA HOKUTO;SATO KATSUHIRO;IMAI AKIRA;HIROSE HIDEKAZU
分类号 H01L31/04;H01L21/368;H01L51/00;H01L51/30;H01L51/42;(IPC1-7):H01L31/04 主分类号 H01L31/04
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