发明名称 NARROW-BAND FLUORINE LASER DEVICE AND FLUORINE EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a narrow-band fluorine laser device capable of being efficiently formed in one line and capable of obtaining a laser output with high efficiency and a fluorine exposure system using the device. SOLUTION: Laser beams L1 containing the two oscillation lines of the first oscillation line (a wavelengthλ1=157.6299 nm) and the second oscillation line (the wavelengthλ2=157.5233 nm) are emitted from an output mirror 2 for a laser chamber 4. The laser beams L1 are passed through a prism 6, an optical path is folded back by a folded prism 7, and the beams are propagated at a long distance, and passed through a window 8 and extracted to the outside. Since the progressive directions of each laser beam of the first and second oscillation lines slightly differ by the dispersion action of the prism 6, laser beams L2 extracted from the window 8 are only the first oscillation line.
申请公布号 JP2001156374(A) 申请公布日期 2001.06.08
申请号 JP19990337941 申请日期 1999.11.29
申请人 KOMATSU LTD 发明人 TAKEHISA KIWAMU;SHIO YASUSHI;NAGAI SHINJI;IWATA YASUAKI
分类号 H01L21/027;H01S3/137;H01S3/223;(IPC1-7):H01S3/137 主分类号 H01L21/027
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