发明名称 MANUFACTURING METHODS OF LEAD PLATING MACHINE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide manufacturing methods of a lead plating machine and a semiconductor device, which can avoid defective mounting caused by attach ment of plated metal dust to any external lead of a semiconductor device when cutting and forming the end of each external lead and can stably give uniform plating to the surface of each external lead of a semiconductor device. SOLUTION: This plating machine has a tank 3, in which a semiconductor device 10 is placed, a tray (negative plate) 1 equipped with a projection 1a making contact with an external lead 2 of the semiconductor device 10, and a top cover 2 equipped with a projection 2a catching and securing the external lead 12 of the semiconductor device 10 placed on the tray (negative plate) 1. The plating machine catches a flat portion 12c of the formed external lead 12 of the semiconductor device 10, which was separated into a discrete chip, and gives plating to the external lead 12.
申请公布号 JP2001156234(A) 申请公布日期 2001.06.08
申请号 JP19990338097 申请日期 1999.11.29
申请人 OITA NIPPON DENKI KK 发明人 ISOMURA YUICHI
分类号 H01L23/50;C25D7/00;(IPC1-7):H01L23/50 主分类号 H01L23/50
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