PHOTOSENSITIVE MATERIAL PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive material processing device which utilizes a narrow processing channel and is small in the volume of a processing liquid. SOLUTION: This photosensitive material processing device is constituted to exactly maintain a level 235 of the processing liquid by maintaining a level of the top surface of the processing liquid at a position lower than the processing liquid outlet of a high-impact device.