| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type electron beam or X-ray resist composition having high sensitivity and high resolving power, capable of giving an excellently rectangular pattern profile and excellent also in PCD and PED stability. SOLUTION: The positive type electron beam or X-ray resist composition contains a compound (a) which generates an acid when irradiated with electron beams or X-rays. The specific gravity of a resist film formed by applying a solution of the composition and drying it by heating is >1.0 to <5.0. |
