发明名称 MAGNETO-RESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a magneto-resistance effect element wherein a power required for recording is reduced even when an element size is reduced while a range for material selection is wide. SOLUTION: A magneto-resistance effect element having a ferromagnetic double tunnel joint is provided where first anti-ferromagnetic layer 1/first ferromagnetic layer 2/first tunnel insulating layer 3/second ferromagnetic layer 4/first non-magnetic layer 5/third ferromagnetic layer 6/second non-magnetic layer 7/fourth ferromagnetic layer 8/second tunnel insulating layer 9/fifth ferromagnetic layer 10/second anti-ferromagnetic layer 11 are laminated. Here, the second and third ferromagnetic layers 4 and 6 are anti-ferromagnetic-combined through the first non-magnetic layer 5 while the third and fourth ferromagnetic layers 6 and 8 are anti-ferromagnetic-combined through the second non-magnetic layer 7.</p>
申请公布号 JP2001156358(A) 申请公布日期 2001.06.08
申请号 JP20000265664 申请日期 2000.09.01
申请人 TOSHIBA CORP 发明人 INOMATA KOICHIRO;SAITO YOSHIAKI;NAKAJIMA KENTARO
分类号 G01R33/09;G11B5/39;G11C11/02;G11C11/14;G11C11/15;H01F10/26;H01F10/32;H01L21/8246;H01L27/105;H01L43/08;(IPC1-7):H01L43/08 主分类号 G01R33/09
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