发明名称 LASER ANNEALING APPARATUS
摘要 PROBLEM TO BE SOLVED: To realize cost reduction and foot print reduction by providing a laser annealer that can project two laser beams, having different shapes upon a substrate. SOLUTION: The laser annealer is provided with an optical system 12 for a rectangular beam and another optical system 23 for a long beam for shaping the laser beam from a laser oscillator 11. The annealing apparatus is also provided with an optical path switching mirror which can advance on and retreat from the optical path between the oscillator 11 and optical system 13 for long beam and a pneumatic cylinder 15 which drives the mirror. The laser beam from the oscillator 11 is made incident to the optical system 13 or 12, and after the beam is shaped through the optical system, which is projected upon the substrate 17 via a mirror 16b or 16c.
申请公布号 JP2001156015(A) 申请公布日期 2001.06.08
申请号 JP19990335400 申请日期 1999.11.26
申请人 SUMITOMO HEAVY IND LTD 发明人 HARADA MAKOTO
分类号 H01L21/268;(IPC1-7):H01L21/268 主分类号 H01L21/268
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