发明名称 RADIATION COMPOSITION FOR COLOR LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a radiation composition for a color liquid crystal display device to be used to form a color layer on a driving substrate of a thin-film transistor(TFT) system color liquid crystal display device, having properties where a through-hole or a U-shape groove can be formed, that on development residue is produced in the developing process, and superior adhesion property with the driving substrate having thin-film transistors(TFT) formed thereon or with a passivation film such as a silicon nitride film. SOLUTION: This radiation composition for a color liquid crystal display device contains (A) a coloring agent, (B) alkali-soluble resin, (C) polyfunctional monomer and (D) photopolymerization initiator. The radiation-sensitive composition is used to form a color layer on a driving substrate of a thin-film transistor(TFT) system color liquid crystal display device.
申请公布号 JP2001154013(A) 申请公布日期 2001.06.08
申请号 JP19990341976 申请日期 1999.12.01
申请人 JSR CORP 发明人 NAGATSUKA TOMIO;ABE SHIGERU
分类号 G03F7/028;C08F2/48;G02B5/20;G02F1/1335 主分类号 G03F7/028
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