| 摘要 |
PROBLEM TO BE SOLVED: To provide a positioning method for an LSI potential distribution image which can be positioned further surely to a potential distribution image by solving the problems of a positioning method, based on the wiring contoured topography of an LSI surface. SOLUTION: A potential distribution image and a layout position are subjected to coordination, so that the gradation in the range of a potential distribution image overlapping in each wiring region calculated from layout data of an LSI is the same. Furthermore, a potential distribution image and a layout position are subjected to coordination, so that gradation in the range of a potential distribution image overlapping in the sum of each group of wirings connected at an equivalent potential by a through-hole mutually and the sum of a group of wirings, which are deemed as being logically the same mutually from connection relation of a logic circuit or in a reverse potential is the same. Additionally, after a potential distribution image is grouped to a region, in coordination with logical potential from its gradation distribution, it can be processed and each grouped region can be subjected compression based on continuous length and held.
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