发明名称 POSITIVE TYPE PHOTOSENSITIVE COMPOSITION AND POSITIVE TYPE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition which does not deposit a triazine compound in a developing solution, is excellent in developability and has good sensitivity, thin line reproducibility and printing resistance and a photosensitive planographic printing plate. SOLUTION: The positive type photosensitive composition contains a di(trihalomethyl)-s-triazine derivative which is photodegraded and generates a radical or an acid and an o-quinonediazido compound. The di(trihalomethyl)-s- triazine derivative is a di(trihalomethyl)-s-triazine compound having a carboxy group and/or a phenolic hydroxyl group in its structure.
申请公布号 JP2001154344(A) 申请公布日期 2001.06.08
申请号 JP19990325069 申请日期 1999.11.16
申请人 MITSUBISHI CHEMICALS CORP 发明人 URANO TOSHIYOSHI
分类号 G03F7/004;G03F7/00;G03F7/022 主分类号 G03F7/004
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