发明名称 |
POSITIVE TYPE PHOTOSENSITIVE COMPOSITION AND POSITIVE TYPE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition which does not deposit a triazine compound in a developing solution, is excellent in developability and has good sensitivity, thin line reproducibility and printing resistance and a photosensitive planographic printing plate. SOLUTION: The positive type photosensitive composition contains a di(trihalomethyl)-s-triazine derivative which is photodegraded and generates a radical or an acid and an o-quinonediazido compound. The di(trihalomethyl)-s- triazine derivative is a di(trihalomethyl)-s-triazine compound having a carboxy group and/or a phenolic hydroxyl group in its structure. |
申请公布号 |
JP2001154344(A) |
申请公布日期 |
2001.06.08 |
申请号 |
JP19990325069 |
申请日期 |
1999.11.16 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
URANO TOSHIYOSHI |
分类号 |
G03F7/004;G03F7/00;G03F7/022 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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