发明名称 SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To improve insertion loss characteristics of a high-frequency switch in a high-frequency circuit. SOLUTION: In a high-frequency switch, constituted of a finger-type MOSFET formed on an Si substrate, a p+-type well contact region 105 for applying a fixed potential to a p-type well 102 is formed in an element isolation layer 101, and a capacitor 109 is formed between the p+ well contact region 105 and the p-type well.
申请公布号 JP2001156182(A) 申请公布日期 2001.06.08
申请号 JP19990339618 申请日期 1999.11.30
申请人 NEC CORP 发明人 KINOSHITA YASUSHI
分类号 H01L27/04;H01L21/822;H01L21/8234;H01L21/8238;H01L27/06;H01L27/092;(IPC1-7):H01L21/823 主分类号 H01L27/04
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